Proceedings of the 13th International LEEM-PEEM Workshop
摘要截稿:
全文截稿: 2025-05-12
影响因子: 2.452
期刊难度:
CCF分类: 无
中科院JCR分区:
• 大类 : 工程技术 - 3区
• 小类 : 显微镜技术 - 1区
Overview
This special issue (SI) represents the Proceedings of the 13th International Workshop on Low Energy Electron Microscopy and Photoemission Electron Microscopy (LEEM-PEEM 13) that (will be/was) held on 19-23 August 2024 in Montreal, Canada. LEEM-PEEM is a biennial meeting reviewing the status of surface microscopies that employ low-energy electrons such as LEEM, PEEM, SPLEEM, SPELEEM, XPEEM, and related techniques. The proceedings gather recent scientific advances from using these techniques as well as instrumental developments in the field.
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Executive Guest Editor
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Prof. Karen KavanaghOrganization*: Department of Physics, Simon Fraser University, British Columbia, CanadaInstitutional Email Address*: kavanagh@sfu.caAreas of Expertise*: Electronic Materials Science, Semiconductor Interfaces: Structure property correlations, 2D Materials and Nanowires, Helium Ion Microscopy, Electron Holography
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Manuscript submission information:
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Submission Deadline: 12-May-2025